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Tetraethyl orthosilicate-E grade

t is mainly used in the chemical vapor deposition (CVD) process during wafer manufacturing, and reacts with O2 / O3 / N2O to form silicon dioxide films. It is an important electronic chemical required for the manufacture of semiconductors, discrete devices, and micro-electromechanical systems (MEMS)
  • Siwin-TEOS electronic grade

  • Siwin

  • Siwin-TEOS electronic grade

  • 78-10-4

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